Nikon CFI Plan Fluor ELWD 60X Phase Contrast Objective 11501502 delivering sub-micron resolution for semiconductor
Description
delivering sub-micron resolution for semiconductor inspection
and infrared imaging
Semiconductor IC defect evaluation and inspection at 100×
The plan apochromat correction ensures accurate chromatic registration across all fluorescence channels — essential for multi-color imaging combining UV-excited calcium indicators with visible fluorophores for simultaneous structural and functional imaging
Fluorescence illumination on Nikon Eclipse series microscopes
Nikon CFI Plan Fluor ELWD 60X Phase Contrast Objective 11501502 delivering sub-micron resolution for semiconductorNikon CFI Plan Fluor ELWD 60X Phase Contrast Objective a high performance, extra long working distance objective engineered for advanced live cell and biological imaging at 60X on Nikon CFI series platforms. 60X magnification with Plan Fluor optical correction Extra Long Working Distance (ELWD) for imaging through thick culture vessels Phase contrast for label free live cell imaging Multi purpose: brightfield, fluorescence, and phase contrast Infinity
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