Olympus MPlanFL N 5X Epi Objective | 0.15 NA, BD, Infinity Corrected 10445906 and reduced risk of sample

and reduced risk of sample contact

Polarized reflected light microscopy — identifying anisotropic materials

offering the highest-in-class 12

🔬 Designed for Olympus MX61 & MX63 — semiconductor and FPD inspection microscopes

Factory-new condition ensures optimal performance and reliability for demanding laboratory applications requiring high-resolution imaging with superior flat-field correction

Olympus MPlanFL N 5X Epi Objective | 0.15 NA, BD, Infinity Corrected 10445906 and reduced risk of samplePremium 5 objective with brightfield and darkfield capability ideal for industrial inspection and materials science applications. 5 Magnification, NA 0. 15 Wide field of view with excellent depth of field for overview imaging and inspection. Brightfield Darkfield (BD) Capability Dual mode imaging for enhanced contrast and defect detection on reflective surfaces. Working Distance (12 mm) Generous clearance provides specimen safety and accommodates